Design of Ge-SiGe Quantum-Confined Stark Effect Electroabsorption Heterostructures for CMOS Compatible Photonics (2010)
Attributed to:
UK Silicon Photonics
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/jlt.2010.2081345
Publication URI: http://dx.doi.org/10.1109/jlt.2010.2081345
Type: Journal Article/Review
Parent Publication: Journal of Lightwave Technology