Effect of an Oxide Cap Layer and Fluorine Implantation on the Metal-Induced Lateral Crystallization of Amorphous Silicon (2012)

First Author: Sun K

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1149/2.038301jss

Publication URI: http://dx.doi.org/10.1149/2.038301jss

Type: Journal Article/Review

Parent Publication: ECS Journal of Solid State Science and Technology

Issue: 1