Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist (2010)

First Author: Koukharenko E

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1143/jjap.49.06ge07

Publication URI: http://dx.doi.org/10.1143/jjap.49.06ge07

Type: Journal Article/Review

Parent Publication: Japanese Journal of Applied Physics

Issue: 6