Laser Interference Lithography based 4D-printing of Nanomaterials
Lead Research Organisation:
University of Bedfordshire
Department Name: Inst for Res in Applicable Computing
Abstract
By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser
interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D
nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks,
producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of
4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are
stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some
established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge
on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to
battery performance/life.
The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for
rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across
patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D
nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique
will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level
collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members
and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the
carefully arranged secondments
interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D
nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks,
producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of
4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are
stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some
established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge
on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to
battery performance/life.
The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for
rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across
patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D
nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique
will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level
collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members
and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the
carefully arranged secondments
Organisations
People |
ORCID iD |
| Dayou Li (Principal Investigator) |