Dual Source Pulsed Plasmas for the Production of Ultra-High Performance Coatings
Lead Research Organisation:
The Open University
Department Name: Physical Sciences
Abstract
SummaryPulsed processing has initiated a new era in surface engineering technologies. For example, pulsed magnetron sputtering has transformed the deposition of dielectric materials. The benefits of pulsed processing can be further capitalised on through the application of mid-frequency pulsed DC power at the substrate. This 'dual source' sputtering mode uses one pulsed power source to generate a plasma in front of the target and a second, similar, source to excite a plasma in front of the substrate. This enables the deposition conditions at the substrate to be controlled independent of the sputtering conditions in a flexible and versatile manner. This offers a new and exciting means of controlling the energy delivered to the substrate during film deposition, which is a critical factor in determining the microstructures and properties of magnetron sputtered coatings. To date, this technique has been largely overlooked. We aim, therefore, to perform the first detailed study of this technique, with a view to producing ultra-high performance coatings, particularly aimed at applications such as dry machining and dry-running components, where environmental pressures to reduce the use of hydrocarbon lubricants demand coatings with properties that present technologies are struggling to deliver.We will investigate the use of dual source discharges in the enhancement and control of the ion-to-atom ratio incident at the substrate during deposition and the effectiveness of the ion etch process prior to deposition. However, in order to exploit the full potential of this new technique, it will also be necessary to undertake detailed measurements of the plasma. Thus, this study will also lead to the advancement of plasma measurement techniques in pulsed discharges. The information gained will allow us to determine the interrelationships between the driving voltage waveforms at the targets and at the substrate and the nature of the multi-excited discharge that forms, and their combined impact on film growth.
Organisations
People |
ORCID iD |
N. Braithwaite (Principal Investigator) |
Publications
Liebig B
(2011)
Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium
in Surface and Coatings Technology
Liebig B
(2010)
Spatial and temporal investigation of high power pulsed magnetron discharges by optical 2D-imaging
in Thin Solid Films
G C B Clarke
(2008)
A robust ion flux diagnostic for deposition plasmas
Description | nothing further to report |
Exploitation Route | Published work is available |
Sectors | Aerospace, Defence and Marine,Manufacturing, including Industrial Biotechology |
Description | Has underpinned subsequent bidding in a consortium for Innovate UK funding. This consortium was funded - see EP/M506825/1 |
First Year Of Impact | 2014 |
Sector | Aerospace, Defence and Marine,Manufacturing, including Industrial Biotechology |
Impact Types | Economic |
Description | Lectures at annual training school for low temperature plasmas |
Form Of Engagement Activity | A talk or presentation |
Part Of Official Scheme? | No |
Geographic Reach | International |
Primary Audience | Professional Practitioners |
Results and Impact | Lectures on technical electrical measurements in plasmas - frequenntly featuring methods and results deriving from my EPSRC funded studies of low temperature plasmas |
Year(s) Of Engagement Activity | 2006,2007,2008,2009,2010,2011,2012,2013,2014,2015 |
URL | http://www.plasma-school.org |