Nanoparticle and Element Distribution Studies of Ion Implantation Processes
Lead Research Organisation:
University of Sheffield
Department Name: Materials Science and Engineering
Abstract
Ion implantation to modify the surface and sub-surface microstructure of substrates is a core process in materials and device technology. In particular the combination of ion implantation with annealing sequences is known to generate a variety of nanostructures, ranging from clusters of few atoms to extend nanoparticles, tunable by implantation energy and annealing parameters. Progress in characterisation techniques now makes it possible to observe and analyse the essential annealing step inside an electroni microscope. Ultra-high resolution through aberration correction techniques allows approaching single atom visibility for high contrast cases. Another major advance in technology is the aplication of heat treatments and gas reaction cells within special attachments to the TEM goniometer.The project will explore the basics of cluster and particle formation, explore the lateral distribution of clusters, and its relationship to the ion beam parameters. Materials and nanostructures which will be generated range from metals (e.g. Zn) over metal oxides (e.g. ZnO), to ferromagnets (e.g. Co), with a choice of isotropic (silica) and uni-axial (A1203-0001) substrates.
Organisations
Publications
Guenter Moebus (Co-Author)
(2012)
Nanoporous membrane gives ion beam patterning powers
Guenter Moebus (Author)
(2012)
Co and Pt implantation through nanoporous masks observed by aberration-corrected STEM and spectrum imaging
Ghatak J
(2012)
In situ TEM observation of lithium nanoparticle growth and morphological cycling.
in Nanoscale
Guan W
(2012)
XTEM characterization of modulated ion implantation through self-organized anodic aluminum oxide (AAO) membranes
in MRS Proceedings
Guan W
(2012)
Patterned ion beam implantation of Co ions into a SiO2 thin film via ordered nanoporous alumina masks.
in Nanotechnology
Ghatak J
(2012)
Electron beam synthesis of 3D metal nanostructures from fluoride precursors
in MRS Proceedings
Guenter Moebus (Co-Author)
(2012)
Heavy ion implantation through nanoporous masks: an STEM/EELS study
Guan W
(2013)
Nanopatterning by ion implantation through nanoporous alumina masks.
in Physical chemistry chemical physics : PCCP
Description | Key findings: What have you discovered or developed through the research funded on this grant? Please explain for a non-specialist audience.* (i) Successful development of novel method of how to laterally pattern substrates by ion implantation on the nanoscale (ii) Successful development of novel method of how to generate ultra-low aspect ratio nanochannel pore arrays (iii) Successful development of novel method of how to inspect patterns achieved through masked ion implantation via usage of electron transparent membranes as substrates for direct TEM imaging and chemical analysis with nm-resolution. (iv) Achievement of Co cluster distributions in SiO2 and Si3N4, patterned through 80nm pores into zones of high implantation dose separated spatially from non-implanted regions In what ways might your findings be taken forward or put to use by others? * (v) Beneficiaries include the industrial sectors of information storage, light harvesting, sensors, surface engineering, electronics & integrated circuits, scaffold patterning. Research outcomes are well publicized through journal papers, conference presentations and a web-report. (vi) The research can potentially be transferred to other research fields, such as applied device patterning, not covered in the project so far. The joint know-how between the University of Sheffield's NanoLAB research centre and the University of Surrey's Ion Beam Centre will remain available for follow-on projects in this field. |
Exploitation Route | In what ways might your findings be taken forward or put to use by others? * Beneficiaries include the industrial sectors of information storage, light harvesting, sensors, surface engineering, electronics & integrated circuits, scaffold patterning. Research outcomes are well publicized through journal papers, conference presentations and a web-report. The research can potentially be transferred to other research fields, such as applied device patterning, not covered in the project so far. The joint know-how between the University of Sheffield's NanoLAB research centre and the University of Surrey's Ion Beam Centre will remain available for follow-on projects in this field. |
Sectors | Digital/Communication/Information Technologies (including Software),Electronics,Energy,Healthcare,Retail |
Description | In what ways might your findings be taken forward or put to use by others? * Beneficiaries include the industrial sectors of information storage, light harvesting, sensors, surface engineering, electronics & integrated circuits, scaffold patterning. Research outcomes are well publicized through journal papers, conference presentations and a web-report. The research can potentially be transferred to other research fields, such as applied device patterning, not covered in the project so far. The joint know-how between the University of Sheffield's NanoLAB research centre and the University of Surrey's Ion Beam Centre will remain available for follow-on projects in this field. |
First Year Of Impact | 2016 |
Sector | Electronics,Energy |
Description | Nanoporous membrane gives ion beam patterning powers |
Form Of Engagement Activity | A magazine, newsletter or online publication |
Part Of Official Scheme? | No |
Geographic Reach | International |
Primary Audience | Media (as a channel to the public) |
Results and Impact | Magazine feature for general audience invited by the Institute of Physics disclosing major findings of this project to an international audience via the IoP's internet portal nanotechweb.org. Magazine article improved visibility of research group on international level and improved level of conference participation in the following years. |
Year(s) Of Engagement Activity | 2012 |
URL | http://iopscience.iop.org/0957-4484/labtalk-article/48686 |