Use of Zintl Ions in Lithography

The project will look at main group clusters (Zintl ions) which are covalently bound groups of group 15 elements (typically P, or As, or Bi) which could be used to direct write semiconductor nanostructures using e-beam lithography.

The project involves synthesis and characterization of new compounds, typically with the Zintl ion bound to solubilizing organic groups or bound to further metalloids, e.g. indium(III).

The compounds are then used to form films on semiconductor surfaces, typically silicon. They are then written with electron beams within a scanning electron microscope. The aim is to make nanostructures of compound semiconductors such as indium phosphide directly.

The research falls with EPSRC's remit for advanced materials.