Advanced Dielectrics for Next Generation Electronics and Optoelectronics

Molecular Vapour Deposition (MVD) is a deposition method that has the capability to create uniform, high quality, conformal films on a variety of surfaces at low temperatures. The aim of the project is to investigate this new, novel deposition technique, to create advanced, high-performance dielectric and other functional coatings which can be used in a variety of applications. The process can then be optimized for each application by investigating parameters that can affect the dielectric properties and film quality e.g., temperature, pressure, precursor flow rate and deposition time. The scalability of each device will also be considered. One potential application at the moment could be anti-reflection coatings