Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of microwave plasma and hot filament chemical vapor deposition reactors (2010)
Attributed to:
Experiment and modelling of the growth of CVD diamond: towards a detailed understanding of growth chemistry and mechanisms
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.3516498
Publication URI: http://dx.doi.org/10.1063/1.3516498
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 11