Understanding the Role of the Low Temperature Seed Layer in the Growth of Low Defect Relaxed Germanium Layers on (111) Silicon by Reduced Pressure CVD (2012)
Attributed to:
Creating Silicon Based Platforms for New Technologies
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/istdm.2012.6222501
Publication URI: http://dx.doi.org/10.1109/istdm.2012.6222501
Type: Conference/Paper/Proceeding/Abstract
ISBN: 978-1-4577-1864-9