Understanding the Role of the Low Temperature Seed Layer in the Growth of Low Defect Relaxed Germanium Layers on (111) Silicon by Reduced Pressure CVD (2012)

First Author: Nguyen V

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/istdm.2012.6222501

Publication URI: http://dx.doi.org/10.1109/istdm.2012.6222501

Type: Conference/Paper/Proceeding/Abstract

ISBN: 978-1-4577-1864-9