Overcoming low Ge ionization and erosion rate variation for quantitative ultralow energy secondary ion mass spectrometry depth profiles of Si(1-x)Ge(x)/Ge quantum well structures. (2012)
Attributed to:
Creating Silicon Based Platforms for New Technologies
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/ac202929x
PubMed Identifier: 22296224
Publication URI: http://europepmc.org/abstract/MED/22296224
Type: Journal Article/Review
Volume: 84
Parent Publication: Analytical chemistry
Issue: 5
ISSN: 0003-2700