SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition (2011)

First Author: Yan L

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1007/s00339-011-6257-8

Publication URI: http://dx.doi.org/10.1007/s00339-011-6257-8

Type: Journal Article/Review

Parent Publication: Applied Physics A

Issue: 1