Metal silicide Schottky barriers on Si and Ge show weaker Fermi level pinning (2012)
Attributed to:
Atomic Layer Interface Engineering for Nanoelectronics (ALIEN): Contacts
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4742861
Publication URI: http://dx.doi.org/10.1063/1.4742861
Type: Journal Article/Review
Parent Publication: Applied Physics Letters
Issue: 5