Thickness control of molecular beam epitaxy grown layers at the 0.01-0.1 monolayer level (2012)
Attributed to:
Manufacturability versus Unmanufacturability
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0268-1242/27/8/085007
Publication URI: http://dx.doi.org/10.1088/0268-1242/27/8/085007
Type: Journal Article/Review
Parent Publication: Semiconductor Science and Technology
Issue: 8