Understanding charge traps for optimizing Si-passivated Ge nMOSFETs (2016)
Attributed to:
High permittivity dielectrics on Ge for end of Roadmap application
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/vlsit.2016.7573367
Publication URI: http://dx.doi.org/10.1109/vlsit.2016.7573367
Type: Conference/Paper/Proceeding/Abstract