Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition (2017)

First Author: Li B

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.carbon.2017.03.032

Publication URI: http://dx.doi.org/10.1016/j.carbon.2017.03.032

Type: Journal Article/Review

Parent Publication: Carbon