Erbium-doped chalcogenide glass thin film on silicon using femtosecond pulsed laser with different deposition temperatures (2018)
Attributed to:
Ultrafast Laser Plasma Implantation- Seamless Integration of Functional Materials for Advanced Photonics
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1007/s00339-018-2286-x
Publication URI: http://dx.doi.org/10.1007/s00339-018-2286-x
Type: Journal Article/Review
Parent Publication: Applied Physics A
Issue: 1