Thermodynamic processes on a semiconductor surface during in-situ multi-beam laser interference patterning (2019)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1049/iet-opt.2018.5028
Publication URI: http://dx.doi.org/10.1049/iet-opt.2018.5028
Type: Journal Article/Review
Parent Publication: IET Optoelectronics
Issue: 1