A lithographic approach for quantum dot-photonic crystal nanocavity coupling in dilute nitrides (2017)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2016.12.003
Publication URI: http://dx.doi.org/10.1016/j.mee.2016.12.003
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering