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A lithographic approach for quantum dot-photonic crystal nanocavity coupling in dilute nitrides (2017)

First Author: Pettinari G

Attributed to: In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2016.12.003

Publication URI: http://dx.doi.org/10.1016/j.mee.2016.12.003

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering