Investigation of Tm 2 O 3 As a Gate Dielectric for Ge MOS Devices (2018)
Attributed to:
High permittivity dielectrics on Ge for end of Roadmap application
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1149/08607.0067ecst
Publication URI: http://dx.doi.org/10.1149/08607.0067ecst
Type: Journal Article/Review
Parent Publication: ECS Transactions
Issue: 7