Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device (2019)

First Author: Ma P

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.jallcom.2019.04.015

Publication URI: http://dx.doi.org/10.1016/j.jallcom.2019.04.015

Type: Journal Article/Review

Parent Publication: Journal of Alloys and Compounds