Direct patterning of periodic semiconductor nanostructures using single-pulse nanosecond laser interference. (2020)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1364/oe.397709
PubMed Identifier: 33114936
Publication URI: http://europepmc.org/abstract/MED/33114936
Type: Journal Article/Review
Volume: 28
Parent Publication: Optics express
Issue: 22
ISSN: 1094-4087