Photonic integration of uniform GaAs nanowires in hexagonal and honeycomb lattice for broadband optical absorption (2020)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/5.0015404
Publication URI: http://dx.doi.org/10.1063/5.0015404
Type: Journal Article/Review
Parent Publication: AIP Advances
Issue: 10