Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements (2019)

First Author: Fang Y
Attributed to:  ZnO MESFETs for application to Intelligent Windows funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2019.111113

Publication URI: http://dx.doi.org/10.1016/j.mee.2019.111113

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering