Plasma-Enhanced Combustion-Processed Al 2 O 3 Gate Oxide for In 2 O 3 Thin Film Transistors (2019)
Attributed to:
ZnO MESFETs for application to Intelligent Windows
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/icicdt.2019.8790939
Publication URI: http://dx.doi.org/10.1109/icicdt.2019.8790939
Type: Conference/Paper/Proceeding/Abstract