Thermal and oxidation stability of Ti x W 1- x diffusion barriers investigated by soft and hard x-ray photoelectron spectroscopy (2021)

First Author: Kalha C

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/5.0048304

Publication URI: http://dx.doi.org/10.1063/5.0048304

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 19