A Comparative Study of AC Positive Bias Temperature Instability of Germanium nMOSFETs With GeO2/Ge and Si-cap/Ge Gate Stack (2021)

Abstract

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Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/jeds.2021.3078540

Publication URI: http://dx.doi.org/10.1109/jeds.2021.3078540

Type: Journal Article/Review

Parent Publication: IEEE Journal of the Electron Devices Society