A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films (2022)
Attributed to:
ZnO MESFETs for application to Intelligent Windows
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.radphyschem.2021.109899
Publication URI: http://dx.doi.org/10.1016/j.radphyschem.2021.109899
Type: Journal Article/Review
Parent Publication: Radiation Physics and Chemistry