📣 Help Shape the Future of UKRI's Gateway to Research (GtR)

We're improving UKRI's Gateway to Research and are seeking your input! If you would be interested in being interviewed about the improvements we're making and to have your say about how we can make GtR more user-friendly, impactful, and effective for the Research and Innovation community, please email gateway@ukri.org.

Negative Tone Metallic Organic Resists with Improved Sensitivity for Plasma Etching: Implications for Silicon Nanostructure Fabrication and Photomask Production. (2022)

First Author: Chaker A

Attributed to: From rings to nanostructures funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsanm.2c02986

PubMed Identifier: 36583125

Publication URI: http://europepmc.org/abstract/MED/36583125

Type: Journal Article/Review

Volume: 5

Parent Publication: ACS applied nano materials

Issue: 12

ISSN: 2574-0970