Fabrication of quantum dot and ring arrays by direct laser interference patterning for nanophotonics (2023)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1515/nanoph-2022-0584
Publication URI: http://dx.doi.org/10.1515/nanoph-2022-0584
Type: Journal Article/Review
Parent Publication: Nanophotonics
Issue: 8