Focused electron beam deposited silicon dioxide derivatives for nano-electronic applications (2022)

First Author: Chapman G
Attributed to:  Integrated Plasma Source Focused Ion Beam with Scanning Electron Microscope funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mssp.2022.106736

Publication URI: http://dx.doi.org/10.1016/j.mssp.2022.106736

Type: Journal Article/Review

Parent Publication: Materials Science in Semiconductor Processing