Doping density, not valency, influences catalytic metal-assisted plasma etching of silicon (2023)
Attributed to:
A Facility for Cryo-Enabled Multi-microscopy for Nanoscale Analysis in the Engineering and Physical Sciences (Cryo-EPS)
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1039/d3mh00649b
Publication URI: http://dx.doi.org/10.1039/d3mh00649b
Type: Journal Article/Review
Parent Publication: Materials Horizons