Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing (2024)
Attributed to:
Precision Manufacturing of Flexible CMOS
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.apmt.2023.102033
Publication URI: http://dx.doi.org/10.1016/j.apmt.2023.102033
Type: Journal Article/Review
Parent Publication: Applied Materials Today
ISSN: 2352-9407