Ultralow contact resistance at an epitaxial metal/oxide heterojunction through interstitial site doping. (2013)
Attributed to:
Multiscale Modelling of Metal-Semiconductor Contacts for the Next Generation of Nanoscale Transistors
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adma.201301030
PubMed Identifier: 23649872
Publication URI: http://europepmc.org/abstract/MED/23649872
Type: Journal Article/Review
Volume: 25
Parent Publication: Advanced materials (Deerfield Beach, Fla.)
Issue: 29
ISSN: 0935-9648