Influence of interlayer properties on the characteristics of high-k gate stacks (2012)
Attributed to:
High permittivity dielectrics on Ge for end of Roadmap application
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.sse.2012.04.042
Publication URI: http://dx.doi.org/10.1016/j.sse.2012.04.042
Type: Journal Article/Review
Parent Publication: Solid-State Electronics