O- density measurements in the pulsed-DC reactive magnetron sputtering of titanium (2010)
Attributed to:
The Study of Magnetized Electronegative Depositing Plasmas
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2010.06.056
Publication URI: http://dx.doi.org/10.1016/j.tsf.2010.06.056
Type: Journal Article/Review
Parent Publication: Thin Solid Films
Issue: 5