Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma (2008)

First Author: Ren Z

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2838180

Publication URI: http://dx.doi.org/10.1063/1.2838180

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 3