Nanometer strain profiling through Si/SiGe quantum layers (2008)

First Author: Agaiby R
Attributed to:  Nanometre Strain Evaluation for Future and Emerging Technologies funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2936883

Publication URI: http://dx.doi.org/10.1063/1.2936883

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 1