High-quality Ge/Si 0.4 Ge 0.6 multiple quantum wells for photonic applications: growth by reduced pressure chemical vapour deposition and structural characteristics (2011)
Attributed to:
UK Silicon Photonics
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0022-3727/44/5/055102
Publication URI: http://dx.doi.org/10.1088/0022-3727/44/5/055102
Type: Journal Article/Review
Parent Publication: Journal of Physics D: Applied Physics
Issue: 5