Performance Enhancements in Scaled Strained-SiGe pMOSFETs With $ \hbox{HfSiO}_{x}/\hbox{TiSiN}$ Gate Stacks (2009)

First Author: Alatise O
Attributed to:  Platform: Strained Si / SiGe: Materials, Technology and Design funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/ted.2009.2028375

Publication URI: http://dx.doi.org/10.1109/ted.2009.2028375

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Electron Devices

Issue: 10