Self-Aligned Silicidation of Surround Gate Vertical MOSFETs for Low Cost RF Applications (2010)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/ted.2010.2082293

Publication URI: http://dx.doi.org/10.1109/ted.2010.2082293

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Electron Devices

Issue: 12