Permittivity enhancement of hafnium dioxide high-? films by cerium doping (2008)
Attributed to:
Liquid injection ALD of Cp- based precursors for deposition of dielectric materials
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.3023059
Publication URI: http://dx.doi.org/10.1063/1.3023059
Type: Journal Article/Review
Parent Publication: Applied Physics Letters
Issue: 18