Determination of Ga auto-incorporation in nominal InAlN epilayers grown by MOCVD (2014)

First Author: Smith M

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/c4tc00480a

Publication URI: http://dx.doi.org/10.1039/c4tc00480a

Type: Journal Article/Review

Parent Publication: Journal of Materials Chemistry C

Issue: 29