Deposition of Low Stress Amorphous Zinc Tin Oxide at Ambient Temperature Using a Remote Plasma Sputtering Process Suitable for Delicate Substrates (2013)

First Author: Pfaendler S

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1149/05008.0073ecst

Publication URI: http://dx.doi.org/10.1149/05008.0073ecst

Type: Journal Article/Review

Parent Publication: ECS Transactions

Issue: 8