High Contrast Superlens Lithography Engineered by Loss Reduction (2012)
Attributed to:
Active Plasmonics: Electronic and All-optical Control of Photonic Signals on Sub-wavelength Scales
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adfm.201200788
Publication URI: http://dx.doi.org/10.1002/adfm.201200788
Type: Journal Article/Review
Parent Publication: Advanced Functional Materials
Issue: 18