Electron beam lithography using plasma polymerized hexane as resist (2010)
Attributed to:
A tool for investigating cell-material interactions: surface chemical and topographical gradients
funded by
BBSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2009.11.043
Publication URI: http://dx.doi.org/10.1016/j.mee.2009.11.043
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering
Issue: 5-8