Novel Molecular Resist for EUV and Electron Beam Lithography (2015)

First Author: Frommhold A
Attributed to:  High-resolution Electron Beam Lithography Critical Mass Grant funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.2494/photopolymer.28.537

Publication URI: http://dx.doi.org/10.2494/photopolymer.28.537

Type: Journal Article/Review

Parent Publication: Journal of Photopolymer Science and Technology

Issue: 4