Atomic-layer deposited thulium oxide as a passivation layer on germanium (2015)
Attributed to:
High permittivity dielectrics on Ge for end of Roadmap application
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4922121
Publication URI: http://dx.doi.org/10.1063/1.4922121
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 21