Improved alignment algorithm for electron beam lithography (2014)

First Author: Thoms S
Attributed to:  Scanning thermal conduction microscopy with dual cantilever resistive probe funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/1.4901015

Publication URI: http://dx.doi.org/10.1116/1.4901015

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Issue: 6