Evaluation of residual stress in sputtered tantalum thin-film (2016)
Attributed to:
A multichannel adaptive integrated MEMS/CMOS microphone
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2016.02.236
Publication URI: http://dx.doi.org/10.1016/j.apsusc.2016.02.236
Type: Journal Article/Review
Parent Publication: Applied Surface Science